• QQ: 1811068585
  • Hotline: +86 13275595566

Hexacarbonyltungsten 六羰基钨

规格: 99%(99.9%-W)
CAS: 14040-11-0
产品编号: H24308
MDL: MFCD00011462
品牌: INFI

ALD简介

   原子层沉积技术(Atomic Layer Deposition,简称ALD)是一种在纳米尺度上进行薄膜沉积的先进技术。通过将物质以单原子形式一层一层的镀在基底表面,拥有优异的三维共形性、大面积成膜的均匀性和精确控制膜厚等特点。

ALD应用

ALD在能源领域应用

2009年,Miyaska课题组将钙钛矿材料MAPbI3用作燃料敏化太阳能电池的光伏活性层,正式开启了钙钛矿太阳能电池的新纪元。ALD凭借其均匀成膜性、精准控制厚度和保形性等多种优势,在光伏领域中发挥着重要作用。除此之外,ALD技术还可用于锂电池薄膜涂层,提高电池性能

ALD在泛半导体应用

随着泛半导体行业的发展,对微型化和集成化要求越来越高,尺寸缩小至亚微米和纳米量级,ALD作为一种高精度薄膜沉积技术,可用于晶体管栅极电介质层(高K材料)、金属栅电极、有机发光显示器涂层、铜互联扩散阻挡层、DRAM电介质层、微流体和MEMS涂层、传感器等众多领域。

ALD在光学领域应用

由于 ALD 具有的三维共形沉积和大面积均匀性特点,已成功应用于高质量光学薄膜、增透膜、折射率可调的光学薄膜、波状多层膜,改善了光子晶体的光学性质和可控性,增加了光子晶体在未来光学器件中的应用潜力。

 公司致力于ALD高纯半导体薄膜前驱体材料的自主研发和生产,成立以来,已陆续向多家半导体客户提供了百余种前驱体新材料,包括高纯硅基前驱体系列、High-k前驱体系列产品,部分新品已被客户用于5nm以下制程薄膜设备。我们致力为客户提供优质的产品并建立互信、长久的合作关系,产品具有自主知识产权且原材料国产化,打破国外垄断的同时保证供应链的安全。研峰科技愿与国内芯片、高端显示、光伏新能源等高端客户一起携手,解决高端半导体材料的把脖子难题,早日实现进口替代。




Chemical NameTungsten hexacarbonyl
PubChem Substance ID24854483
EC Number237-880-2
Synonym Tungsten carbonyl (W(CO)6), (OC-6-11)- Tungsten carbonyl (W(CO)6) Tungstencarbonyl,99%(99.9+%-W)sublimed Tungstenhexacarbonyl Tungstencarbonyl(W(CO)6),(OC-6-11)- Tungsten hexacarbonyl, sublimed, 99.9+% metals basis Tungstene hexacarbonyl NSC 173699 tungstenehexacarbonyl (OC-6-11)-Tungstencarbonyl Wolframhexacarbonyl TUNGSTEN CARBONYL Tungsten carbonyl (oc-6-11)-tungstencarbonyl(w(co)6 Tungstencarbonyl(W(CO)6) W(CO)6 Hexacarbonyl wolfram Tungsten carbonyl 99% Hexacarbonylwolfram TUNGSTEN CARBONYL 99% (<0.3%-MO) Tungstencarbonyl,99%(<0.1%-Mo) Tungsten hexacarbonyl Hexacarbonyltungsten (0) Tungsten carbonyl Tungstenhexacarbonyl 六羰基钨 Hexacarbonyltungsten 六羰基钨 HEXACARBONYLTUNGSTEN Hexacarbonyltungsten (0)
Chemical Name Translation六羰基钨
InChIKeyFQNHWXHRAUXLFU-UHFFFAOYSA-N
LabNetwork Molecule IDLN02003227
MDL NumberMFCD00011462
CAS Number14040-11-0
GHS Symbol
WGK Germany3
Hazard Codes T
Hazard statements
  • H301+H311+H331
    Personal Protective Equipment Eyeshields, Gloves, type N95 (US), type P1 (EN143) respirator filter
    Precautionary statements
    • P301+P310
    • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
    • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
    • P311 Call a POISON CENTER or doctor/physician. 呼叫解毒中心或医生/医师。
      Signal word Danger
      RTECSYO7705000
      Safety Statements
      • S45 In case of accident or if you feel unwell seek medical advice immediately (show the label where possible) 发生事故时或感觉不适时,立即求医(可能时出示标签);
      • S36 Wear suitable protective clothing 穿戴适当的防护服;
      • S36/37 Wear suitable protective clothing and gloves 穿戴适当的防护服和手套;
      • S36/37/39 Wear suitable protective clothing, gloves and eye/face protection 穿戴适当的防护服、手套和眼睛/面保护;
      • S28 After contact with skin, wash immediately with plenty of ... (to be specified by the manufacturer) 皮肤接触后,立即用大量…(由生产厂家指定)冲洗;
      • S38 In case of insufficient ventilation wear suitable respiratory equipment 通风不良时,佩带适当的呼吸器;
        UN Number UN3466
        Risk Statements
        • R23/24/25 Toxic by inhalation, in contact with skin and if swallowed 吸入,皮肤接触及吞食都有毒
        • R23/25 Toxic by inhalation and if swallowed 吸入及吞食都有毒
          Packing GroupIII
          Hazard Class6.1
          Restrict -
        • 用于制备含钨的复合物和材料,也用于光化学。用于合成 Fischer 卡宾配合物的前体,可将 Pd(II) 还原为纳米微粒型 Pd(0),Pd(0) 在 Hiyama 交叉偶联反应中具有催化活性.
        • {SA}
        • 1. Maruyama, T., Arai, S. J. Electrochem. Soc. 4 , 1021, (1994)
        • {SA}
        • 2. Mulders, J. J. L.; Belova, L. M.; Riazanova, A. Nanotechnology 5th ed., 22 , 055302/1, (2011)
        • {SA}
        • Fieser 6 ,658 / Fieser 8 ,525 / Fieser 14 ,345
        • {SA}
        • Aldrich MSDS 1 , 1821:B / Corp MSDS 1 (2), 3559:C / FT-IR 2 (3), 4590:B / FT-IR 1 (2), 1299:A / RegBook 1 (2), 3141:C / Sax 6 , 1505
        • {uni_hamburg} Short: II/25D
        • Title: Structure Data of Free Polyatomic Molecules: Molecules Containing Five or More Carbon Atoms
        • Author: Graner, G.; Hirota, E.; Iijima, T.; Kuchitsu, K.; Ramsay, D.A.; Vogt, J.; Vogt, N.
        • Editor: Kuchitsu, K.
        • Source: Landolt-Börnstein, New Series
        • Volume: II/25D
        • Year: 2003
        • Keyword: Free Polyatomic Molecules; Carbon Atoms; Molecules
        • ISBN: 3-540-42860-7
        • ISBN: 978-3-540-42860-2
        • Internet Resource: DOI:10.1007/b75952
        • RefComment: VIII, 569 pages. Hardcover
        • RefComment: Written for scientists and researchers in the fields of chemistry and physics
        • Abstract: This fourth subvolume presents data on the geometric parameters (internuclear distances, bond angles, dihedral angles of internal rotation etc) of free polyatomic molecules including free radicals and molecular ions. The survey on structure data consists of four subvolumes, each containing the geometric parameters determined in the gas phase either by an analysis of the rotational constants (and sometimes the vibrational constants) obtained from microwave, infrared, Raman, electronic and photoelectron spectroscopy or by an analysis of electron diffraction intensities. Most of the structures listed in the tables are for molecules in the electronic ground state, but structures for electronically excited states have also been included as far as they are available. In this fourth subvolume, the structure of molecules containing five to sixty carbon atoms is listed.
        • {uni_hamburg} Short: III/35D5
        • Title: Nuclear Magnetic Resonance (NMR) Data: Chemi
        • 化学属性

          Density2.65 g/mL at 25 °C(lit.)
          TSCAYes
          Vapor Density12.1 (vs air)
          Vapor Pressure1.2 mmHg ( 67 °C)
          Boiling Point175°C
          Solubility不溶
          Flash Point200°C
          Mol. FormulaW(CO)6
          Mol. Weight352
          Appearance white xtl. white to off-white pwdr.
          Melting Point169-170°C dec.
          Danger-Level-
          pH-:-
          Redox-

          *以上化合物性质及应用等信息仅供参考